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<ArticleSet>
<Article>
<Journal>
				<PublisherName>The Physics Society of Iran</PublisherName>
				<JournalTitle>Iranian Journal of Physics Research</JournalTitle>
				<Issn>1682-6957</Issn>
				<Volume>22</Volume>
				<Issue>3</Issue>
				<PubDate PubStatus="epublish">
					<Year>2022</Year>
					<Month>11</Month>
					<Day>22</Day>
				</PubDate>
			</Journal>
<ArticleTitle>Effect of antimony concentration on optical, electrical and structural
 properties of copper antimony sulphide thin films deposited by spray pyrolysis technique</ArticleTitle>
<VernacularTitle>Effect of antimony concentration on optical, electrical and structural
 properties of copper antimony sulphide thin films deposited by spray pyrolysis technique</VernacularTitle>
			<FirstPage>89</FirstPage>
			<LastPage>94</LastPage>
			<ELocationID EIdType="pii">3291</ELocationID>
			
<ELocationID EIdType="doi">10.47176/ijpr.22.3.71283</ELocationID>
			
			<Language>FA</Language>
<AuthorList>
<Author>
					<FirstName>Nancy</FirstName>
					<LastName>Obare</LastName>
<Affiliation>Department of Physics, Masinde Muliro University of Science and Technology, P.O Box 190-50100, Kakamega, Kenya</Affiliation>

</Author>
<Author>
					<FirstName>Victor</FirstName>
					<LastName>Odari</LastName>
<Affiliation>Department of Physics, Masinde Muliro University of Science and Technology, P.O Box 190-50100, Kakamega, Kenya</Affiliation>

</Author>
<Author>
					<FirstName>Maxwel</FirstName>
					<LastName>Mageto</LastName>
<Affiliation>Department of Physics, Masinde Muliro University of Science and Technology, P.O Box 190-50100, Kakamega, Kenya.
 Materials Research Society of Kenya, P.O. Box 15653-00503 Nairobi, Kenya.</Affiliation>
<Identifier Source="ORCID">0000-0003-2720-6212</Identifier>

</Author>
</AuthorList>
				<PublicationType>Journal Article</PublicationType>
			<History>
				<PubDate PubStatus="received">
					<Year>2021</Year>
					<Month>07</Month>
					<Day>18</Day>
				</PubDate>
			</History>
		<Abstract>Copper antimony sulphide (CuSbS&lt;sub&gt;2&lt;/sub&gt;) is a semiconductor with narrow band gap and a potential absorber material for applications in various optoelectronic devices like infrared detectors and solar cells. In this paper, CuSbS&lt;sub&gt;2&lt;/sub&gt; thin films were deposited by spray pyrolysis technique on glass substrates at a temperature of 3000 ℃, using cupric chloride, antimony chloride, and thiourea as precursors. The samples were prepared by varying the antimony concentration (0.1M, 0.15M, and 0.2M) at a pressure of 3.5 bar and a solution flow rate of 2 ml/min for 5 minutes, while the precursor solutions of Cu:S molar ratio (0.1:0.2) was maintained. Elemental, morphological, optical, and structural characterization of these films was done from data obtained from energy dispersive X-ray fluorescence (EDXRF), UV-VIS spectrophotometer, scanning electron microscope (SEM) and X-Ray diffraction (XRD) respectively. The prepared thin films were polycrystalline with a preferential peak at (111).  Electrical properties of the thin films were obtained by simulating the UV-VIS spectra in SCOUT software using the Drude and Kim oscillator model. Deposited films have a band gap range of 1.84 – 1.98 eV, conductivity range of 199.59 – 204.67 Ω&lt;sup&gt;-1&lt;/sup&gt;cm&lt;sup&gt;-1&lt;/sup&gt;, and carrier concentration range of 1.12×10&lt;sup&gt;19&lt;/sup&gt; - 1.27×10&lt;sup&gt;19&lt;/sup&gt;  cm&lt;sup&gt;-3&lt;/sup&gt;.</Abstract>
			<OtherAbstract Language="FA">Copper antimony sulphide (CuSbS&lt;sub&gt;2&lt;/sub&gt;) is a semiconductor with narrow band gap and a potential absorber material for applications in various optoelectronic devices like infrared detectors and solar cells. In this paper, CuSbS&lt;sub&gt;2&lt;/sub&gt; thin films were deposited by spray pyrolysis technique on glass substrates at a temperature of 3000 ℃, using cupric chloride, antimony chloride, and thiourea as precursors. The samples were prepared by varying the antimony concentration (0.1M, 0.15M, and 0.2M) at a pressure of 3.5 bar and a solution flow rate of 2 ml/min for 5 minutes, while the precursor solutions of Cu:S molar ratio (0.1:0.2) was maintained. Elemental, morphological, optical, and structural characterization of these films was done from data obtained from energy dispersive X-ray fluorescence (EDXRF), UV-VIS spectrophotometer, scanning electron microscope (SEM) and X-Ray diffraction (XRD) respectively. The prepared thin films were polycrystalline with a preferential peak at (111).  Electrical properties of the thin films were obtained by simulating the UV-VIS spectra in SCOUT software using the Drude and Kim oscillator model. Deposited films have a band gap range of 1.84 – 1.98 eV, conductivity range of 199.59 – 204.67 Ω&lt;sup&gt;-1&lt;/sup&gt;cm&lt;sup&gt;-1&lt;/sup&gt;, and carrier concentration range of 1.12×10&lt;sup&gt;19&lt;/sup&gt; - 1.27×10&lt;sup&gt;19&lt;/sup&gt;  cm&lt;sup&gt;-3&lt;/sup&gt;.</OtherAbstract>
		<ObjectList>
			<Object Type="keyword">
			<Param Name="value">Spray pyrolysis</Param>
			</Object>
			<Object Type="keyword">
			<Param Name="value">thin films</Param>
			</Object>
			<Object Type="keyword">
			<Param Name="value">CuSbS2</Param>
			</Object>
			<Object Type="keyword">
			<Param Name="value">antimony cocemtration</Param>
			</Object>
			<Object Type="keyword">
			<Param Name="value">SCOUT</Param>
			</Object>
		</ObjectList>
<ArchiveCopySource DocType="pdf">https://ijpr.iut.ac.ir/article_3291_980a875ff6ef9c2d75e74307cbf5d205.pdf</ArchiveCopySource>
</Article>
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