In this paper, the resonance optical absorption method, is used to measure the Cu atoms number density in different power levels of power supply. Atoms are sputtered from a Cu target during plasma magnetron sputtering deposition. For the light source, a commercial Cu hollow cathode lamp is used. For measurement of gas temperature, a small percentage of N2 is added to the gas mixture and the gas temperature is found by optical emission technique.
Naghshara,H. , Sobhanian,S. and Sadeghi,N. (2019). The usage of resonance optical absorption method for measurement of Cu atoms during the plasma sputtering deposition. Iranian Journal of Physics Research, 11(1), 55-61.
MLA
Naghshara,H. , , Sobhanian,S. , and Sadeghi,N. . "The usage of resonance optical absorption method for measurement of Cu atoms during the plasma sputtering deposition", Iranian Journal of Physics Research, 11, 1, 2019, 55-61.
HARVARD
Naghshara H., Sobhanian S., Sadeghi N. (2019). 'The usage of resonance optical absorption method for measurement of Cu atoms during the plasma sputtering deposition', Iranian Journal of Physics Research, 11(1), pp. 55-61.
CHICAGO
H. Naghshara, S. Sobhanian and N. Sadeghi, "The usage of resonance optical absorption method for measurement of Cu atoms during the plasma sputtering deposition," Iranian Journal of Physics Research, 11 1 (2019): 55-61,
VANCOUVER
Naghshara H., Sobhanian S., Sadeghi N. The usage of resonance optical absorption method for measurement of Cu atoms during the plasma sputtering deposition. Dear user; Recently we have changed our software to Sinaweb. If you had already registered with the old site, you may use the same USERNAME but you need to change your password. To do so at the first use, please choose, 2019; 11(1): 55-61.
