In this study, indium-tin-oxide thin films in different thickness ranges were prepared by electron beam evaporation method on the glass substrate at room temperature. The thicknesses of films were 100, 150 and 250nm. Using fractal analysis, morphological characteristics of surface films thickness in amorphous state were investigated. The results showed that by increasing thickness, surface roughness (RMS) and lateral correlation length ( x ) were decreased. Also, the roughness exponent a and growth exponent b were determined to be 0.72 ± 0.01 and 0.11, respectively. Based on these results, we understand that the growth films can be described by the combination of the Edwards-Wilkinson equation and Mullins diffusion equation.
Hosseinpanahi,F. and Raoufi,D. (2019). Fractal analysis of the surface of indiumâtin-oxide. Iranian Journal of Physics Research, 12(3), 245-251.
MLA
Hosseinpanahi,F. , and Raoufi,D. . "Fractal analysis of the surface of indiumâtin-oxide", Iranian Journal of Physics Research, 12, 3, 2019, 245-251.
HARVARD
Hosseinpanahi F., Raoufi D. (2019). 'Fractal analysis of the surface of indiumâtin-oxide', Iranian Journal of Physics Research, 12(3), pp. 245-251.
CHICAGO
F. Hosseinpanahi and D. Raoufi, "Fractal analysis of the surface of indiumâtin-oxide," Iranian Journal of Physics Research, 12 3 (2019): 245-251,
VANCOUVER
Hosseinpanahi F., Raoufi D. Fractal analysis of the surface of indiumâtin-oxide. Dear user; Recently we have changed our software to Sinaweb. If you had already registered with the old site, you may use the same USERNAME but you need to change your password. To do so at the first use, please choose, 2019; 12(3): 245-251.
