Volume 11, Issue 1 (Iranian Journal of Physics Research, Spring 2011)                   IJPR 2011, 11(1): 55-61 | Back to browse issues page

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Naghshara H, Sobhanian S, Sadeghi N. The usage of resonance optical absorption method for measurement of Cu atoms during the plasma sputtering deposition. IJPR. 2011; 11 (1) :55-61
URL: http://ijpr.iut.ac.ir/article-1-658-en.html

Tabriz University , naghshara@yahoo.com
Abstract:   (10579 Views)
In this paper, the resonance optical absorption method, is used to measure the Cu atoms number density in different power levels of power supply. Atoms are sputtered from a Cu target during plasma magnetron sputtering deposition. For the light source, a commercial Cu hollow cathode lamp is used. For measurement of gas temperature, a small percentage of N2 is added to the gas mixture and the gas temperature is found by optical emission technique.
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Type of Study: Research | Subject: General

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