The effect of oxygen flow rate on refractive index of aluminum oxide film deposited by electron beam evaporation technique

Shakouri, R; Haydari, H

doi:10.18869/acadpub.ijpr.15.4.435

The effect of oxygen flow rate on refractive index of aluminum oxide film deposited by electron beam evaporation technique

Authors

R Shakouri

H Haydari

https://doi.org/10.18869/acadpub.ijpr.15.4.435

Abstract

The effects of oxygen flow rate on refractive index of aluminum oxide film have been investigated. The Al2O3 films are deposited by electron beam on glass substrate at different oxygen flow rates. The substrate was heated to reach and the temperature was constant during the thin film growth. The transmittance spectrum of samples was recorded in the wavelength 400-800 nm. Then, using the maxima and minima of transmittance the refractive index and the extinction coefficient of samples were determined. It has been found that if we reduce the oxygen flow, while the evaporation rate is kept constant, the refractive index of Al2O3 films increases. On the other hand, reduced oxygen pressure causes the Al2O3 films to have some absorption.

Keywords

aluminum oxide film

extinction coefficient

refractive index

1. E Ciliberto, I Fragala, R Rizza, G Spoto, and G C Allen, Appl. Phys. Lett. 67 (1995) 1624.
2. K P Pande, V K R Nair, and D Gutierrez, J. Appl. Phys. 54 (1983) 5436.
3. P Vuoristo, T Mäntylä, P Kettunen, and R Lappalainen, Thin Soil Films 204 (1991) 297.
4. S Jakschik, A Avellan, U Schroeder, and J Bartha IEEE Trans. Electron. Dev. 51 (2004) 2252.
5. W H Ha, M H Choo, and S Lm, Journal of Non-Crystalline Solids 78 (2002) 303.
6. B G Segda, M Jacquet, and J P Besse, Vacuum 62 (2001) 27.
7. A Khanna, D G Bhat, A Harris, and B D Beake, Surf. Coat. Technol. 201 (2006) 1109.
8. F Fietzke, K Goedicke, and W Hempel, Surf. Coat. Technol. 86 (1996) 657.
9. O Zywitzki, K Goedicke, and H Morgner. Surf. Coat. Technol. 14 (2002) 151.
10. P V Patil, D M Bendale, R K Puri, and V Puri. Thin Solid Films 288 (1996) 120.
11. C H Lin, H L Wang, and M H Hon, Thin Solid Films 283 (1996) 171.
12. Z W Zhao, B K Tay, S P Lau, and C Y Xiao, J. Vac. Sci. Technol. A 21 (2003) 906.
13. M Aguilar Frutis, M Garcia, C Falcony, G Plesch, and S Jimenez Sandoval, Thin Solid Films 389 (2001) 200.
14. P O Nilsson, Appl. Opt. 7 (1968) 435.
15. R C McPhedran, L C Botten, D R McKenzie, and R P Netterfield, Appl. Opt. 23 (1984) 1197.
16. E A A El-Shazly, I T Zedan, and K F Abd El-Rahman, Vacuum 86 (2011) 318.
17. H E Atyia, and N A Hegab, Physica B 454 (2014) 189.
18. J S Ross, R A Mailman, D J Kester, and J D Wisnosky, Proc. Soc. Vac. Coalers 38 (1995) 81.
19. “Essential MacLeod”, Thin Film Center Inc., Tucson, AZ, USA, http://www.thinfilmcenter.com/.
20. D Minkov, J. Opt Soc. Am. A 8 (1991) 306.
21. W C Olive and G M Pharr, J. Mater. Res. 7 (1992) 1564.
22. N Maiti et al., Vacuum 85 (2010) 214.
23. S Shuzhen, C Lei, H Haihong, Y Kui, F Zhengxiu, and S Jianda, Applied Surface Science 242 (2005) 437.
24. K S Shamala, L C S Murthy, and K Narasimha Raob, Materials Science and Engineering B 106 (2004) 269.
25. S K Kim, S W Lee, C S Hwang, Y S Min, J Y Won, and J Jeong, J. of the Electrochemical Society 153 (2006) F 69.
26. N Reddy, V Rajagopal, N Sridhara, S Basavaraja, and