Authors
Abstract
Tungsten trioxide (WO3) thin films were coated onto fluorine tin oxide coated glass substrates, using electrodeposition technique via aqueous solution of peroxotungstic acid. WO3 films were evaluated as a function of annealing temperature (60°C, 100°C, 250°C and 400°C). The films were analyzed by field emission Scanning Electron Microscopy (SEM), UV-visible spectrometer and cyclic voltammogram. The films had high transmission in optical visible region. Using optical transmittance and cyclic voltammogram measurements, the electrochromic properties of WO3 films were investigated in a non-aqueous lithium perchlorate in propylene carbonate electrolyte. Increasing the annealing temperature will decrease electrochromic and optical properties of WO3 films, since it leads to increasing the size of grains. Therefore, having been annealed at 60°C, WO3 film exhibited a noticeable electrochromic performance with a high transmission modulation and Coloration Efficiency Efficiency (CE) of 64.1 cm2 C−1 at wavelength equal to 638 nm
Keywords
2. L Yang, D Ge, J Zhao, Y Ding, X Kong, and Y Li, Sol. Energy Mat. Sol. C 100 (2012) 251.
3. A E Aliev and H W Shin, Displays 23 (2002) 239.
4. C G Granqvist, P C Lansaker, N R Mlyuka, G A Niklasson, and E Avendano, Sol. Energy Mat. Sol. C 93 (2009) 2032.
5. S N Alamri, Sol. Energy Mat. Sol. C 93 (2009)1657.
6. R Baetens, B P Jelle, and A Gustavsen, Sol. Energy Mat. Sol. C 94 (2010) 87.
7. H Huang, J Tian , W K Zhang, Y P Gan, X Y Tao, X H Xia, and J P Tu, Electrochim. Acta 56 ( 2011) 4281.
8. C G Granqvist, S Green, G A Niklasson, N R Mlyuka, S von Kraemer, and P Georen, Thin Solid Films 518 (2010) 3046.
9. J Zhang, X L Wang, Y Lu, Y Qiao, X H Xia, and J P Tu, J. Solid State Electr. 15 (2011) 2213.
10. K Tajima, Y Yamada, S H Bao, M Okada, and K Yoshimura, Vacuum 84 (2010) 1460.
11. K Hari Krishna, O M Hussain, and C M Julien, Appl. Phys. A 99 (2010) 921.
12. B Baloukas, J M Lamarre, and L Martinu, Sol. Energ. Mat. Sol. C 95 (2011) 807.
13. X H Xia, J P Tu, J Zhang, X L Wang, W K Zhang, and H Huang, ACS Appl. Mater. Interfaces 2 (2010) 186.
14. B Yang, P R F Barnes, W Bertram, and V Luca, J. Mater. Chem. 17 (2007) 2722.
15. M Deepa, A K Srivastava, S N Sharma, G Govind, and S M Shivaprasad, Appl. Surf. Sci. 254 (2008) 2342.
16. M Giannouli and G Leftheriotis, Sol. Energy Mat. Sol. C 95 (2011) 1932.
17. A H Yan, C S Xie, D W Zeng, S Z Cai, and H Y Li, J. Alloys Compd. 495 (2010) 88.
18. J Zhang, X L Wang, X H Xia, C D Gu, Z J Zhao, and J P Tu, Electrochim. Acta 55 (2010) 6953.
19. R Deshpande, S H Lee, A H Mahan, P A Parilla, K M Jones, A G Norman, B To, J L Blackburn, S Mitra, and A C Dillon, Solid State Ion. 178 (2007) 895.
20. H S Shim, J W Kim, Y E Sung, and W B Kim, Sol. Energy Mat. Sol. C 93 (2009) 2062.
21. B B Cao, J J Chen, X J Tang, and W L Zhou, J. Mater. Chem. 19 (2009) 2323.
22. J Zhang, X L Wang, X H Xia, C D Gu, and J P Tu, Sol. Energy Mat. Sol. C 95 (2011) 2107.
23. Y S Lin, S S Wu, and T H Tsai, Sol. Energ. Mat. Sol. C 94 (2010) 2283.
24. W Cheng, E Baudrin, B Dunn, and J I Zink, J. Mater. Chem. 11 (2001) 92.
25. S Badilescu and P V Ashrit, Solid State Ionics 158 (2003) 187.
26. N Ozer, Thin Solid Films 304 (1997) 310.
27. P K Biswas, N C Pramanik, M K Mahapatra, and D Ganguli, J. Livage, Mater. Let. 57 (2003) 4429.
28. I Shiyanovskaya, M Hepel, and E Tewksburry, J. New Mat. Elect. Syst. 3 (2000) 241.
29. H Yang, F Shang, L Gao, and H Han, Appl. Surf. Sci. 253 (2007) 5553.
30. M Regragui, M Addou, B El Idrissi, J C Bernede, A Outzourhit, and E Ec chamikh, Mater. Chem. Phys. 70 (2001) 84.
31. M Deepa, R Sharma, A Basu, and S A Agnihotry, Electrochim. Acta 50 (2005) 3545.
32. J H Choy, Y I Kim, B W Kim, N G Park, G Campet, and J D Grenier, Chem. Mater. 12 (2000) 2950.
33. P V Ashrit, Thin Solid Films 385 (2001) 81.
34. T Pauporte, J. Electrochem. Soc. 149 (2002) C539.
35. T Brezesinki, D F Rohlfing, S Sallard, M Antonietti, and B M Smarsly, Small 2 (2006) 1203
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