Iranian Journal of Physics Research

An introduction to lithography methods and providing a practical method for its optimization

Document Type : Review Article

Authors

Arashmid Nahal
Seyed Reza Hosseini

Photonic Materials Research Laboratory, Department of Physics, College of Science, University of Tehran, Tehran, Iran

https://doi.org/10.47176/ijpr.22.1.31218
Abstract
In the first part of the present article, the important and main methods of photolithography are reviewed and discussed. Then we introduce the ways to improve the images created on the photoresist, which is the main material of lithography. Lithography with high-energy particle and soft lithography are then described. In the second part, the contact-photolithography method and its improvement process, which we use in our laboratory, are introduced and described in detail. We used this method for lithography to make diffraction optical elements on a glass substrate, doped by silver nanoparticles, using a helium ion beam. Light diffraction from the created lithography masks prevents access to very small images. To reduce the diffraction influence on the quality of the produced elements, we adapted and optimized the contact-lithography method for our project. Our solution, presented in this article, is practical and available for other researchers in Iran

Keywords

lithography
light-sensitive materials
photoresist
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