Investigating the effect of annealing on structural and optical properties of TiO2 and SiO2 broadband reflective layers coated by the plasma sputtering method

Salmaniannezhad, Hossein; Salmaniannezhad, Hassan; Zarei Moghadam, Reza; Khani, Mohammad Reza; Shokri, Babak

doi:10.47176/ijpr.24.2.21649

Investigating the effect of annealing on structural and optical properties of TiO2 and SiO2 broadband reflective layers coated by the plasma sputtering method

Document Type : Original Article

Authors

Hossein Salmaniannezhad ¹

Hassan Salmaniannezhad ¹

Reza Zarei Moghadam ²

Mohammad Reza Khani ³

Babak Shokri ¹

¹ Laser and Plasma Research Institute, Shahid Beheshti University, Tehran, Iran Faculty of Physics, Shahid Beheshti University

² Department of Physics, Faculty of Sciences, Arak University, Arak, Iran

³ Laser and Plasma Research Laser and Plasma Research Institute, Shahid Beheshti University, Tehran, Iran Faculty of Physics, Shahid Beheshti University

https://doi.org/10.47176/ijpr.24.2.21649

Abstract

In this article, the effect of annealing on the structural and optical properties of TiO2 and SiO2 antireflection coatings was investigated. The thin layer was placed on the silicon substrate by sputtering and then annealed for 1 hour at different temperatures. By examining the optical properties of the samples, it was observed that after annealing, the reflection from the surface in the wavelength range of 450-750 nm decreased from 2.7 to 0.23%. The refractive index of the samples also decreased after annealing. Also, by examining the structural properties of the samples, the anatase phase before annealing and the mixture of anatase and rutile and the increase in the intensity of the peaks after annealing were observed.

Keywords

anti-reflective coatings

sputtering

annealing

Subjects

Thin Films

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