Document Type : Original Article
Authors
- Hossein Salmaniannezhad 1
- Hassan Salmaniannezhad 1
- Reza Zarei Moghadam 2
- Mohammad Reza Khani 3
- Babak Shokri 1
1 Laser and Plasma Research Institute, Shahid Beheshti University, Tehran, Iran Faculty of Physics, Shahid Beheshti University
2 Department of Physics, Faculty of Sciences, Arak University, Arak, Iran
3 Laser and Plasma Research Laser and Plasma Research Institute, Shahid Beheshti University, Tehran, Iran Faculty of Physics, Shahid Beheshti University
Abstract
In this article, the effect of annealing on the structural and optical properties of TiO2 and SiO2 antireflection coatings was investigated. The thin layer was placed on the silicon substrate by sputtering and then annealed for 1 hour at different temperatures. By examining the optical properties of the samples, it was observed that after annealing, the reflection from the surface in the wavelength range of 450-750 nm decreased from 2.7 to 0.23%. The refractive index of the samples also decreased after annealing. Also, by examining the structural properties of the samples, the anatase phase before annealing and the mixture of anatase and rutile and the increase in the intensity of the peaks after annealing were observed.
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