Utilization of the time-temperature gradient post annealing process for enhancing femtosecond laser induced damage threshold of TiO2 optical films/ verification by XPS study

Bananej, Alireza; Khatiri, Mahdieh; Shahrokhabadi, Hossein; Parsa, Zohreh; Adelkhani, Hadi

doi:10.47176/ijpr.25.3.22030

Utilization of the time-temperature gradient post annealing process for enhancing femtosecond laser induced damage threshold of TiO2 optical films/ verification by XPS study

Document Type : Original Article

Authors

Alireza Bananej ¹

Mahdieh Khatiri ²

Hossein Shahrokhabadi ¹

Zohreh Parsa ³

Hadi Adelkhani ⁴

¹ 1Photonics and quantum technology research school, Nuclear Science and Technology Research Institute

² Photonics and quantum technology research school, Nuclear Science and Technology Research Institute

³ Kharazmi university, Physics Department, Iran

⁴ Nuclear fuel cycle research school, Nuclear Science and Technology Research Institute

https://doi.org/10.47176/ijpr.25.3.22030

Abstract

In this study we have investigated the effect of controlled post annealing process on the optical properties, chemical composition, and theoretical predictions of femtosecond laser induced damage threshold of TiO₂ thin films. It has been shown, by using time temperature gradient annealing process, optical properties of the deposited films can be tailored, and hence, predicted ultra-fast laser induced damage threshold can be enhanced considerably. Also, the above results were in a good agreement with the XPS results of the deposited samples at two distinct annealing processes.

Keywords

Damage threshold

Femtosecond laser

Annealing

Time- temperature gradient

Xray photoelectron spectroscopy

Subjects

Surface Physics

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