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آشنایی با لیتوگرافی و ارائة روشی کاربردی برای بهینه‌سازی آن

نوع مقاله : مقاله مروری

نویسندگان

آزمایشگاه پژوهشی مواد فوتونیکی، دانشکده فیزیک، پردیس علوم، دانشگاه تهران

چکیده

از آنجایی که برای انجام درست هرکاری ابتدا باید دانش و شناخت کافی از آن موضوع پیدا کنیم، ما در بخش نخست این مقاله ابتدا به مرور بر روش‌های مهم و اصلی لیتوگرافی نوری و طبقه‌بندی آنها می‌پردازیم. سپس به معرفی راه‌های بهبود تصاویر ایجاد شده روی فتورزیست که بستر اصلی لیتوگرافی است پرداخته و لیتوگرافی با ذرات پر انرژی و لیتوگرافی نرم را بررسی می‌کنیم. در بخش دوم مقاله روش فتولیتوگرافی تماسی و فرایند بهبود آن که در آزمایشگاه ما انجام شده است، با جزئیات معرفی و شرح داده می‌شود. از این روش برای لیتوگرافی جهت ساخت قطعات اپتیکی پراشی روی یک بستر شیشه‌ایی آلاییده شده به نانوذرات نقره توسط یک باریکة یون هلیوم استفاده کردیم. جهت کاهش اثر پراش، ما روش تماسی را برای کار خود سازگاز و بهینه‌سازی کردیم. راهکار ما که در این مقاله ارائه شده است برای سایر پژوهشگران در ایران عملی و در دسترس است

کلیدواژه‌ها

عنوان مقاله [English]

An introduction to lithography methods and providing a practical method for its optimization

نویسندگان [English]

  • Arashmid Nahal
  • Seyed Reza Hosseini

Photonic Materials Research Laboratory, Department of Physics, College of Science, University of Tehran, Tehran, Iran

چکیده [English]

In the first part of the present article, the important and main methods of photolithography are reviewed and discussed. Then we introduce the ways to improve the images created on the photoresist, which is the main material of lithography. Lithography with high-energy particle and soft lithography are then described. In the second part, the contact-photolithography method and its improvement process, which we use in our laboratory, are introduced and described in detail. We used this method for lithography to make diffraction optical elements on a glass substrate, doped by silver nanoparticles, using a helium ion beam. Light diffraction from the created lithography masks prevents access to very small images. To reduce the diffraction influence on the quality of the produced elements, we adapted and optimized the contact-lithography method for our project. Our solution, presented in this article, is practical and available for other researchers in Iran

کلیدواژه‌ها [English]

  • lithography
  • light-sensitive materials
  • photoresist
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مجلۀ پژوهش فیزیک ایران
دوره 22، شماره 1 - شماره پیاپی 87
خرداد 1401
صفحه 1-14
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هم رسانی
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